Intel Officially Launches 45nm Penryn Family

INTEL’S FUNDAMENTAL ADVANCE IN TRANSISTOR DESIGN EXTENDS MOORE’S LAW, COMPUTING PERFORMANCE

SANTA CLARA, Calif., Nov. 11, 2007 – Built using an entirely new transistor formula that alleviates the wasteful electricity leaks that threaten the pace of future computer innovation, Intel Corporation today unveiled 16 server and high-end PC processors. In addition to increasing computer performance and saving energy use, these processors also eliminate eco-unfriendly lead and, in 2008, halogen materials.

Called the biggest transistor advancements in 40 years by Intel Co-Founder Gordon Moore, the processors are the first to use Intel’s Hafnium-based high-k metal gate (Hi-k) formula for the hundreds of millions of transistors inside these processors. These Intel® Core™ 2 Extreme and Xeon® processors are also the first to be manufactured on the company’s 45-nanometer (nm) manufacturing process, further boosting performance and lowering power consumption.

The new 45nm (a nanometer is 1 billionth of a meter) processors boast nearly twice the transistor density of previous chips built on the company’s 65nm technology – that is up to 820 million transistors for quad-core processors, each using Intel’s new formula.

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